Place of Origin : Jiaozuo,China
Delivery Terms : Depends On The Quantities. Generally The Lead Time Is Anytime.
Product Capacity : 30000 Pcs / Month
Payment Terms : T/T In Advance Or Pay On Delivery
R plane(1-102) sapphire wafers are preferred for the hetero-epitaxial deposition of silicon used in microelectronic IC applications. R plane is the non-polar plane of sapphire. So the different positions of R-plane in sapphire devices, the mechanical, thermal, electrical and optical properties of sapphire devices will vary greatly, which will also affect the subsequent processing performance, processing efficiency and processing yield of sapphire devices.
R Plane(1-102) Sapphire Wafers Are Preferred For The Hetero-epitaxial Deposition Of Silicon Used In Microelectronic IC Applications. R Plane Is The Non-polar Plane Of Sapphire. So The Different Positions Of R-plane In Sapphire Devices, The Mechanical, Thermal, Electrical And Optical Properties Of Sapphire Devices Will Vary Greatly, Which Will Also Affect The Subsequent Processing Performance, Processing Efficiency And Processing Yield Of Sapphire Devices.
In Order To Make The Crystal Structure Of Sapphire Ingot And Subsequent Sapphire Products Consistent, The More Common Method Is To Process An A-direction Surface On The Sapphire Ingot As The Flat Orientation Of Sapphire Wafer (subsequent Sapphire Products), So That The R-direction Position Of Sapphire Ingot And The Wafer Is Consistent.
Specifications Of R Plane Sapphire Wafers
