Place of Origin : Fuzhou,China
Planar Ceramic Sputtering Target
Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target.
Planar Ceramic Sputtering Target
Excellent Properties Such As High Purity, High Density,Good Microstructure Uniformity, Excellent Electrical Properties.
High Purity: The Metal Target Requires Very High Purity, To Ensure The Stability And Reliability Of The Material.We Have Various Purity Levels To Suit Your Specific Requirements, With The Minimum Purity Of 99.5% Up To 99.9999% For Some Metals. Also Have Controlled Specific Impurities within The Target.
High Density: Metal Targets Have High Density Characteristics, Usually Up To 95-99.5%,(ITO,NbOx Can Reach 99.5%) to Ensure The Stability And Quality Of Materials.
High Thermal Conductivity: the Thermal Conductivity Of The Metal Target Is Particularly High, Which Can Be Cooled Quickly And Improve The Coating Speed.
Microstructure Uniformity: powder Metallurgy Process To Ensure The Overall Uniformity Of The Target.
Excellent Electrical Properties: Reliable Atmosphere Sintering Enables Stable Electrical Conductivity Of Oxides With Semiconductor Characteristics.
* Maximum Sizes Of Planar Target
Thickness: 30mm (can Be 60mm For Round Target)
Width: Max 2000mm
Length: Max 4000mm
